非平衡磁控溅射沉积TiC/a-C多层膜的组织结构  

Microstructure of TiC/a-C Multilayered Films Prepared by Unbalanced Magnetron Sputtering

作　　者：肖晓玲[1] 洪瑞江[1] 林松盛[1] 李洪武[1] 侯惠君[1] 

机构地区：[1]广州有色金属研究院,广东广州510651

出　　处：《材料科学与工程学报》2008年第5期684-687,672,共5页Journal of Materials Science and Engineering

基　　金：广东省自然科学基金资助项目(06026151A)

摘　　要：本文采用非平衡磁控溅射沉积技术,分别以石墨和甲烷气体为碳源,制备TiC/a-C多层膜。利用X-射线衍射仪、透射电子显微镜、俄歇电子能谱仪和拉曼光谱仪等实验手段对所沉积的TiC/a-C多层膜的组织形态、结构及成份进行了分析。结果表明:所制备的两种TiC/a-C薄膜中,TiC的晶粒呈柱状生长;用溅射石墨靶方法获得的TiC/a-C薄膜,无明显的层状结构,a-C相为石墨化和非石墨化的碳原子构成,碳原子的有序化程度较大;而采用甲烷气体为碳源沉积的TiC/a-C薄膜,呈规则的分层结构,碳原子的有序化程度低。采用过渡层及添加适当的金属元素能改善膜/基的结合强度。TiC/a-C multilayered films were prepared by unbalanced magnetron sputtering using different carbon sources. X-Ray diffraction （XRD）, transmission electron microscope （TEM）, Auger electron spectroscopy and Raman spectroscopy had been used to investigate the microstructure and composition of the deposited films. It was found that the composite films consist of non-graphitizable carbon phase and columnar TiC grains. No obvious multilayer structure and more ordered graphitic microstructure were observed in TiC/a-C film fabricated by sputtering graphite target, while layered structure formed in TiC/a-C film with low ordered graphitic microstructure prepared by using methane as carbon source. The adhesion strength of the films was improved by adding an intermediate layer or some proper metals.

关 键 词：TiC/a-C薄膜 非平衡磁控溅射 组织形态 

分 类 号：O484.5[理学—固体物理]