衬底温度对激光脉冲沉积氧化锌薄膜结构及发光性能的影响  

Effects of Substrate Temperature on Structural and Photoluminescence Properties of ZnO Films by Pulsed Laser Deposition

作　　者：李少兰[1] 

机构地区：[1]鲁东大学学报编辑部,山东烟台264025

出　　处：《吉林师范大学学报（自然科学版）》2008年第4期44-46,共3页Journal of Jilin Normal University:Natural Science Edition

基　　金：山东省自然科学基金项目(Y2002A09)

摘　　要：在单晶硅衬底上用激光脉冲沉积方法制备了氧化锌薄膜,研究了衬底温度对薄膜结构、形貌和发光性能的影响.ZnO films were prepared by pulsed laser deposition on crystal silicon substrate. The effects of substrate temperature on structural and photoluminescence properties of ZnO films were studied.

关 键 词：脉冲激光沉积 氧化锌薄膜 光致发光 

分 类 号：O472.3[理学—半导体物理]