全息光刻-离子束刻蚀制作磁性亚微米结构  

Sub-Micron Structures of Magnetic Materials Fabricated by Laser Holographic Lithography Combined with Ion Beam Etching

作　　者：张自军[1] 徐向东[1] 刘颖[1] 邱克强[1] 付绍军[1] 洪义麟[1] 郭玉献[1] 徐鹏寿[1] 蔡建旺[2] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029 [2]中国科学院物理研究所磁学国家重点实验室,北京100080

出　　处：《真空科学与技术学报》2008年第6期493-497,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金(No.10435050)资助项目

摘　　要：激光干涉制作亚微米尺寸磁性周期结构中,基底材料具有高反射率,由于垂直驻波的影响,光刻胶浮雕图形侧壁产生"束腰",本文将O2反应离子刻蚀引入到制作工艺中,对光刻胶图形进行修正,获得了很好的效果,具有工艺简单、可控性好等特点。以50nm厚的由磁控溅射生长的Ta/Co0.9Fe0.1/Ta薄膜为基底,采用激光干涉光刻结合离子束刻蚀转移图形的方式,制作出了特征尺寸为330nm Co0.9Fe0.1亚微米周期结构,并采用SQUID的技术对其磁滞回线进行了研究。A novel technique has been successfully developed, in which laser holographic lithography and ion beam etching are combined, to fabricate periodic, sub-micron scale and/or nano-scale structures of highly reflective magnetic materials. Its strengths include easy operation and high controllability. Discussions focused on solutions of the many technical problems, including high reflectivity of the substrates, existing of the vertical standing wave patterns, and the “waist effect” occurred on side walls of the coating patterns. The oxygen reactive etching and the pattern modification of the painting produce well-defined structures. A periodic array with feature sizes of 330nm has been successfully fabricated of the 50nm thick,Co0.9Fe0.1 films, on magnetron sputtered Ta/Co0.9Feo.1/Ta substrate,by the newly developed technique under its optimized conditions. The hysteresis loops of the patterned films, measured with a highly sensitive superconducting quantum interference device（SQUID）, display good magnetic characteristics.

关 键 词：光刻胶灰化 全息光刻 垂直驻波 磁性微结构 

分 类 号：O436.1[机械工程—光学工程] O484.43[理学—光学]