几种高反膜设计新方法  

Review of Highly Reflecting Layer Fabrication Technologies

作　　者：干蜀毅[1,2] 刘正坤[1] 徐向东[1] 洪义麟[1] 刘颍[1] 周洪军[1] 霍同林[1] 付绍军[1] 

机构地区：[1]中国科技大学国家同步辐射实验室,安徽合肥230029 [2]合肥工业大学真空教研室,安徽合肥230009

出　　处：《真空科学与技术学报》2008年第6期547-552,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：现代科技的发展对增反膜提出的要求越来越高，具体表现在两个方面：一是要求在现有基础上进一步提高反射率，拓宽高反膜带宽，二是将高反膜的波长向短波方向延伸至真空紫外-x射线。本文总结了近年来出现的一些思路独特的增反膜设计新方法，包括Needle设计法、Staggered broad-band reflecting muhilayers法、Sub-quarterwave multilayers法、Layered synthetic microstructure／quasi-periodic multilayers法、Layer by layer法、带阻挡层的Layer by layer法及Wide range multilayer设计法。给出了这些设计方法的思路，以真空紫外-X射线反射膜为侧重点。对增反膜设计、制作过程中尚存的一些重大问题也进行了阐述。The strengths and weaknesses of the design and fabrication technologies of newly-developed, highly reflecting lyaers, including needle method, design of staggered broad-band reflecting multi-layers （SBBRM）, sub-quarter-wave multi-layers of highly absorbing materials （SQW）, layered synthetic microstructure/quasi-periodic multi-layers （LSM）, layer-by-layer design method for multi-layers with barrier layers, and wide range multilayer design method, were reviewed in a thought provoking way. Discussions focused on the design considerations with emphasis on reflecting layers of vacuum ultraviolet light and X-ray. Some existing problems in design and fabrication of highly reflecting mirrors and their possible solutions were also tentatively discussed.

关 键 词：反射膜 高反膜 膜系设计 真空紫外 X射线 

分 类 号：TB43[一般工业技术]