Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta_2O_5 thin films  

作　　者：周继承 罗迪恬 李幼真 刘正 

机构地区：[1]School of Physics Science and Technology,Central South University

出　　处：《中国有色金属学会会刊：英文版》2009年第2期359-363,共5页Transactions of Nonferrous Metals Society of China

基　　金：Project(60371046) supported by the National Natural Science Foundation of China

摘　　要：Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing(RTA). Influence of sputtering pressure and annealing temperature on surface characteristics,microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta2O5 thin films are amorphous. It takes hexagonal structure(δ-Ta2O5) after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure(L-Ta2O5) occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing（RTA）. Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin films are amorphous. It takes hexagonal structure （δ-Ta2O5） after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure （L-Ta2O5） occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.

关 键 词：直流反应磁控溅射 快速热退火 光学性质 钽薄膜 压力 薄膜沉积 退火温度 TA2O5 

分 类 号：TB383.2[一般工业技术—材料科学与工程]