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作 者:郑华均[1] 钟金环[1] 郑正德[1] 王醒东[1]
机构地区:[1]浙江工业大学化工与材料学院纳米科学与技术工程研究中心,浙江杭州310032
出 处:《高校化学工程学报》2009年第2期279-283,共5页Journal of Chemical Engineering of Chinese Universities
摘 要:通过电化学阳极氧化-化学溶蚀技术制备了一种由无数纳米凸点和凹点所构成的新型铝基纳米点阵模板。采用直流反应磁控溅射法在这种新型模板上沉积得到氧化锌纳米结构薄膜。在室温下观察了氧化锌纳米结构薄膜的形貌,测定材料的晶体结构和光致发光(PL)性能,并讨论了不同溅射时间下制备的氧化锌纳米阵列结构以及其对氧化锌PL谱的性能影响。结果表明,采用直流反应磁控溅射-铝基纳米点阵模板可以制备ZnO纳米结构薄膜;PL谱表明溅射时间为10min得到的氧化锌薄膜在396.5nm和506.4nm处分别出现紫外发射峰和蓝绿色荧光发射峰;随着溅射时间延长,氧化锌薄膜PL谱伴有红移现象且强度逐渐增强。这可能是由于改善了晶粒结构导致不能观测到ZnO薄膜的深能级发射峰所致。A novel aluminum lattice membrane (ALM) textured by numerous nanodots with nanopitches was prepared via the technologies of electrochemical anodization and chemical etching. Using the prepared ALM as template and under suitable conditions, the DC reactive magnetron sputtering technique was employed to deposit the nanostructured zinc oxide films on the template. At room temperature, the surface topologies of the prepared nanostructured ZnO film samples were characterized and their compositions were analyzed. It shows that the new ALM template and DC reactive magnetron sputtering technique can be successfully used to fabricate the nanostructured ZnO film. The structures of the nanostruetured ZnO films prepared with different deposition durations by sputtering were investigated, and the effect of sputtering deposition duration on the photoluminescence (PL) spectra of the ZnO film prepared was discussed too. The PL spectra show that the ZnO film prepared with a short deposition duration (10 min) presents a UV emission at 396.5 nm and a blue-green fluorescence emission at 506.4 nm; with the increase of sputtering deposition duration during preparation, on the PL spectra the UV emission intensity of the ZnO film prepared gradually enhances and accompanies with a red-shift; however, since the structure of the ZnO film may be improved by the relatively long deposition duration, there is no deep emission bands can be observed.
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