Nikon光刻机对准系统概述及模型分析  

Nikon Stepper Alignment System and Analysis of Alignment Modeling

作　　者：何峰[1] 吴志明[1] 王军[1] 袁凯[1] 蒋亚东[1] 李正贤 

机构地区：[1]电子薄膜与集成器件国家重点实验室,电子科技大学,四川成都610054 [2]上海微高精密机械工程有限公司,上海201203

出　　处：《电子工业专用设备》2009年第4期8-12,18,共6页Equipment for Electronic Products Manufacturing

摘　　要：对准系统是光刻机中最精密复杂的部分,掌握对准原理是设计和使用光刻机的关键之一。阐述Nikon步进投影光刻机(Stepper)的对准机制,详细介绍目前应用于Nikon步进光刻机硅片对准的三种对准方式:LSA、FIA、LIA,比较它们的优缺点。并结合数学模型对影响Nikon对准模型信号强度进行分析,为提高对准精度提供了依据,对实际应用有一定的指导作用。Alignment system is the most sophisticated part of stepper, and understanding the principles of alignment is one of the keys to using and designing lithography machine. In the paper, firstly we introduce the alignment system of Nikon stepper, then compare three styles of alignment in Nikon stepper： LSA, FIA, LIA, at last, combined with mathematical models of Nikon stepper alignment to analyze alignment signal intensity for improving the accuracy of alignment, the results provide a certain guiding function for the practical application.

关 键 词：对准系统 步进光刻机 对准方式 对准模型 

分 类 号：TN305.7[电子电信—物理电子学]