氮化碳薄膜的耐腐蚀性和热稳定性研究  

The Studies on Etching proof and Heat stability of Carbon Nitride Thin Film

作　　者：郭怀喜[1] 吴大维[1] 何孟兵[1] 傅德君[1] 张志宏[1] 范湘军[1] 王国梅[2] 

机构地区：[1]武汉大学 [2]武汉工业大学

出　　处：《材料科学与工程》1998年第1期47-49,共3页Materials Science and Engineering

基　　金：国家自然科学基金

摘　　要：本文研究了氮化碳薄膜在氢氟酸，氢氟酸加硝酸混和酸中的抗腐蚀作用。研究表明合金钢表面镀氮化碳薄膜之后，能显著降低阳极金属电化学腐蚀电流，使金属表面明显钝化。采用热失重－差热分析方法研究氮化碳薄膜的热稳定性和抗氧化性表明，加热氮化碳薄膜至１２００℃，未见明显热失重和热反应。The etching proof ability of Carbon Nitride thin film in hydrofluoric acid and in the mixture of hydrofluoric and nitric acid is studied in this essay. The results indicate:after plating carbon nitride thin film on the surface of metal, anode electrochemical current is significantly reduced and the surface of metal become dull with good etching proof. The investigatioin of heat stability and antioxidation ability of carbon nitride thin film by adopting thermal gravimetric (TG) and thermal differential analysis (TDA) method indicates that the carbon nitride thin film has no obvious weight loss or heat reaction even being heated to 1200℃.

关 键 词：氮化碳 耐腐蚀性 热稳定性 薄膜 

分 类 号：O484.4[理学—固体物理]