沉积压力对非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与性能影响研究  

Study of Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating Affected by Deposition Pressure

作　　者：周晖[1] 万志华[1] 郑军[1] 桑瑞鹏[1] 温庆平[1] 

机构地区：[1]兰州物理研究所表面工程技术国防科技重点实验室,甘肃兰州730000

出　　处：《润滑与密封》2009年第5期9-12,41,共5页Lubrication Engineering

基　　金：航天支撑技术项目(417010802)

摘　　要：采用非平衡磁控溅射沉积技术制备MoS2-Ti复合薄膜,研究了沉积压力对薄膜的结构和性能的影响。利用XRF、轮廓仪和XRD分析测试薄膜的成分、厚度和晶相结构,用CSEM薄膜综合性能测试仪测试薄膜的硬度和与基底间的附着力,用球-盘摩擦试验机和真空环模系统评价薄膜的真空摩擦磨损性能。结果表明:降低沉积压力使溅射粒子的平均自由程变大,薄膜沉积过程中再溅射作用加强,对薄膜的结构和性能产生较大的影响。沉积压力升高,薄膜中S和Mo原子比和Ti质量分数随之增大,变化范围分别为1.50～1.77和5.8%～8.1%,薄膜沉积厚度先增大后减小,薄膜晶相结构从明显的(002)基面优势取向向准晶态转变;薄膜的硬度、与基底间的附着力都随沉积压力的升高而降低,薄膜硬度变化范围是5.7～3.5GPa,薄膜与基底间附着力变化范围是100～75mN;薄膜在真空环境中的减摩性能不受工作压力变化影响,摩擦因数平均值为0.02,波动范围为0.01～0.04,薄膜耐磨寿命随沉积压力升高依次为9000,21500,28000,18000m,工作压力低时再溅射作用破坏了MoS2分子层间的滑移能力从而使其耐磨寿命降低。MoS2-Ti composite coatings were deposited by unbalanced magnetron sputtering system,the effect of deposi- tion pressure on coating structure and mechanical performance was studied. Coating composition, thickness and crystal structure were analyzed using XRF, profilometer and XRD, coating nanohardness and adhesion force to substrate were measured using CSEM nanoindentation and nanoscratch tester, coating tribological properties in vacuum environment were then decreases, and coating structure changes from predominant basal （002） planes orientation to quasi-amorphous. When deposition pressure increases from 0. 1 to 1.6 Pa, coating nanohardness decreases from 5.7 to 3.5 GPa, its critical load de- creases from 100 to 75 mN. Coating lubricating properties are same, average friction coefficient is 0. 02 and fluctuates be- tween 0. 01-0. 04,coating wear life is 9 000,21 500,28 000 and 18 000 m respectively.

关 键 词：非平衡磁控溅射 MoS2-Ti复合薄膜 沉积压力 结构和性能 

分 类 号：TH117.1[机械工程—机械设计及理论]