高能聚焦质子束无掩模刻写方法研究初步  

Proton beam writing of microstructures on Shanghai SPM system

作　　者：刘江峰[1,2] 包良满[1] 李晓林[1] 

机构地区：[1]中国科学院上海应用物理研究所,上海201800 [2]信阳师范学院,信阳464000

出　　处：《核技术》2009年第6期443-447,共5页Nuclear Techniques

基　　金：国家自然科学基金项目(10490182);信阳师范学院青年基金(20080212)资助

摘　　要：在中国科学院上海应用物理研究所的扫描质子微探针装置上,研制了图形化扫描器,同时研究了适合质子束刻写的光刻胶制备、显影、定影技术。在此基础上,开展高能聚焦质子束无掩模刻写实验,在厚度约11μm的PMMA光刻胶上刻写出高纵横比的任意图案,取得了初步质子刻写结果,为进一步开展质子纳米束刻写奠定基础。Proton beam writing （PBW） is a direct writing technique allowing the creation of three-dimensional structures with a high aspect ratio in the micrometer and nanometer range in photoresist materials without the use of a templates. On the scanning proton microprobe （SPM） at Shanghai Institute of Applied Physics, this technique was established recently. In this paper, progresses in this area of research are presented. PBW was successfully performed with the positive resist polymethyl methacrylate （PMMA）. With the new scanning system being commissioned, a new scan program was developed and tested which is dedicated to the creation of arbitrarily shaped structures.

关 键 词：微结构 质子束刻写 无掩模 光刻胶 

分 类 号：TL99[核科学技术—核技术及应用] TN305[电子电信—物理电子学]