辅助加热PCVD-TiN薄膜的性能及结构分析  

Analyses of Propertics and Structure on Auxiliary Heating PCVD TiN Coatings

作　　者：彭红瑞[1] 石玉龙[1] 谢雁[1] 李世直[1] 赵程[1] 

机构地区：[1]青岛化工学院等离子体表面技术研究所

出　　处：《金属热处理》1998年第8期15-17,共3页Heat Treatment of Metals

摘　　要：研究了反应气体对辅助加热ＰＣＶＤ－ＴｉＮ薄膜制备的影响。结果表明，提高反应气体中ＴｉＣｌ４的含量ＴｉＮ薄膜内的氯含量基本不变。提高反应气体中的Ｈ２／Ｎ２比可以略降低薄膜内的氯含量，在Ｈ２／Ｎ２＝２、ＴｉＣｌ４约为１０％时ＴｉＮ薄膜的硬度最高，ＴｉＮ薄膜仍呈柱状结构，具有较强的（２００）晶面织构。The effect of deposition gases on auxiliary heating PCVD TiN coatings has been studied The experiments indicated that with the increase of TiC1 4 content in reaction gases the content of Cl in TiN film maintained constant With the increase of H 2/N 2 the content of Cl decreased a little,and at H 2/N 2=2,TiCl 4 content at 10%,the microhardness of TiN reached its maximum value TiN film is still columnar structure and obvious (200) crystal texture.

关 键 词：辅助加热 PCVD 反应气体 薄膜 氮化钛 高速钢 

分 类 号：O484[理学—固体物理] TG174.4[理学—物理]