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出 处:《真空科学与技术学报》2009年第4期431-434,共4页Chinese Journal of Vacuum Science and Technology
摘 要:显示技术正朝着柔性化、超薄化方向发展,低温制备柔性ITO薄膜已经成为一大趋势。本文在射频磁控溅射过程中,引入在线紫外辐照,室温条件下在有机衬底上制备柔性ITO薄膜的工艺,其最低方块电阻为5Ω,电阻率为2.5×10-4Ω.cm,透光率为92%,远远优于未采用紫外辐照制备的柔性ITO薄膜。我们用四探针测试仪、分光光度计、原子力显微镜、X射线衍射仪等测试仪器,对未采用和采用在线紫外辐照制备的薄膜进行测试,分析探讨了紫外线辐照对薄膜的光电性能、表面形貌和生长取向的影响。研究结果表明:在紫外线的照射下,ITO薄膜表面形貌得到改善,晶界缺陷减少,生长更均匀,致密度更好,在降低薄膜电阻率的同时,提高了薄膜在可见光区的透射率,在紫外辐照下,ITO薄膜更趋于〈222〉的择优取向,且平均晶粒尺寸变大,结晶度提高,宏观表现为薄膜的电阻率降低。The indium tin oxides(ITO) films were deposited on flexible substrates of polythy!ene terephthalate(PET) by RF magnetmn sputtering under ultraviolet(UV)irradiation at room temperature. The ITO films were characterized with X-ray diffraction(XRD) ,atomic force microscopy(AFM) and conventional surface probes. Good 1TO films, with a sheet resistance of 5Ω, a resistivity of 2.5 × 10^-4Ω. cm and a transmittance of 92%, outperform those grown without UV irradiation. The results show that the UV irradiation significantly improves the microstructures and properties of the ITO films. For example, the UV irradiation reduces the density of grain boundary defects, improves the surface roughness and compactness, enlarges averaged grain size, lowers the resistivity and increases the transmittance in visible range. Moreover, anincreased(222)preferred growth orientation can be observed.
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