极紫外光刻投影光学系统的研究  

Principle Design of EUVL Projection Optics

作　　者：秦秋霞[1] 

机构地区：[1]郑州交通技师学院,河南郑州450016

出　　处：《光机电信息》2009年第7期35-38,共4页OME Information

摘　　要：本文探讨了一种可应用于极紫外光刻光学系统的离轴五反射镜系统,它在光学质量、自由工作距离方面满足了极紫外光刻商业化的要求。在此基础上,文章对精密非球面加工和计算机辅助光学装校也进行了探讨。A new design of off-axis five mirrors optics was presented which was used to extreme-ultraviolet lithography. It was very suit for the commercialization at optical quality and free work distance. In order to accomplish this aim, the final aspherical mirror processing and computer- assistant optical adjustment were also discussed.

关 键 词：极紫外 投影光学系统 光刻 

分 类 号：TH703[机械工程—仪器科学与技术]