光栅光阀器件的结构改进与制作工艺研究  

Grating Light Valve's Structure Improvement and Its Manufacture Technolog

作　　者：张巍[1] 耿煜[1] 侯昌伦[1] 杨国光[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,杭州310027

出　　处：《光子学报》2009年第8期1926-1931,共6页Acta Photonica Sinica

基　　金：浙江省科技计划项目(2006C31003)资助

摘　　要：根据光栅光阀的工作原理,在结构上对传统的光栅光阀器件进行了改进,分析了改进后光栅光阀器件的光学特性、结构特性,以及制作工艺流程.改进后的光栅光阀结构中硅基底上设有二氧化硅隔离层,隔离层上沉积无定形硅作为牺牲层,可动梁的材料是氮化硅,固定梁为蒸镀的金属铝层.通过离子刻蚀的方法刻蚀图形,用化学腐蚀方法掏空牺牲层得到所需桥梁状结构.研究表明改进后的器件黑区范围小,驱动电压较低,光学效率较高,具有潜在的应用前景.A grating light valve′s structure improvement is proposed based on its working principle.The optical characteristics,structure characteristics and fabrication technology of the improved grating light valve are analyzed.In the improved structure,silicon dioxide layer is on silicon substrate as isolation layer and amorphous silicon is deposited on silicon dioxide layer as sacrificial layer.Movable ribbon′s material is silicon nitride and fixed ribbon′s is aluminium film.After ion etching and chemical etching,the structure of bridge-like shape is got.Through study,satisfactory results were obtained including small black area,low driving voltage and high optical intensity,and this kind of grating light valve has potential future in application.

关 键 词：光栅光阀 结构改进 微加工 刻蚀 

分 类 号：TN256[电子电信—物理电子学]