两种陶瓷薄膜的透射电镜研究  

Transmission Electron Microscopy Study on Microstructures of two Hard Coating Deposited by Magnetron Sputtering

作　　者：罗庆洪[1] 陆永浩[1] 娄艳芝[2] 王燕斌[1] 杨会生[1] 

机构地区：[1]北京科技大学材料物理与化学系,北京100083 [2]北京航空材料研究院,北京100095

出　　处：《现代科学仪器》2009年第4期15-17,共3页Modern Scientific Instruments

基　　金：国家自然科学基金(No.50871018)资助课题

摘　　要：采用高分辨透射电镜技术对两种硬质薄膜(AlTiN多层薄膜和AlCN非晶薄膜)样品的显微结构进行了研究。结果表明:在高速钢基体上制备的AlTiN多层薄膜由两种氮含量交替变化的膜层构成,尽管交替的两层中氮含量不同,但每一单层都为纳米晶包含在非晶点阵中的纳米复合结构,不同之处是低氮含量层中纳米晶密度较小;生长在单晶硅基体(100)晶面上的非晶AlCN薄膜,在膜基界面处硅基体上出现应力畸变层,应力畸变层厚度很薄,约3～5个原子层。比较Si的应变层和非应变区的傅里叶变换结果,片状的应变层产生形状效应,使得傅里叶变换图中斑点沿垂直于片状应变层方向拉长成线状。The AlTiN multilayer and AlCN monolayer hard coatings were studied by high-resolution transmission electron microscopy （HRTEM） on microstructure. The result indicated that the AlTiN multilayer coating deposited on high speed steel substrates with alternated nitrogen contents in layers. In each layer, AlTiN exhibited nanocomposites of nanocrystallites embedded into amorphous matrices despite of the nitrogen content. The difference between bilayers was that AlTiN layer with lower nitrogen content had a lower density of nanocrystallites. The AlCN coating deposited on Si （100） substrate appeared a strained layer on substrate in the film-substrate interface, which thickness was 3-5 atom layer. Comparison of the differences in FTT image between strained layer and non-strained layer, there are shape effect on Lamellar strained layer, which make spots in FTT image elongate and show linear.

关 键 词：显微结构 硬质薄膜 磁控溅射 

分 类 号：TH74[机械工程—光学工程]