CVD金刚石在电真空器件中的应用  

Applications of CVD Diamond Film to Vacuum Electronic Devices

作　　者：李新宇[1] 郭辉 刘征[1] 高陇桥[1] 

机构地区：[1]北京真空电子技术研究所,北京100016 [2]河北激光研究所,河北石家庄050081

出　　处：《真空电子技术》2009年第4期27-31,35,共6页Vacuum Electronics

摘　　要：介绍了化学气相沉积(CVD)金刚石膜应用于电真空器件夹持杆及输能窗方面的研究进展,和国外对CVD金刚石封接的几种技术解决方案以及国内CVD金刚石膜金属化及封接方面的研究情况。The research progress on applications of CVD diamond film to the support rod and output window of vacuum electronic devices were described in this paper. Different CVD diamond sealing process which used by foreign companies were introduced. The domestic research development on CVD diamond film metallization and sealing were discussed.

关 键 词：CVD金刚石膜 电真空器件 封接 

分 类 号：O484[理学—固体物理]