大型旋转圆柱形磁控溅射器  

The Large-Scale Rotating Cylindric Magnetron Sputtering

作　　者：黄士勇[1,2] 王德苗[1,2] 曲风钦[1,2] 苗晔 

机构地区：[1]烟台大学物理系 [2]浙江大学信电系

出　　处：《真空电子技术》1998年第4期39-41,共3页Vacuum Electronics

摘　　要：提出并研制成功了一种新型旋转圆柱形磁控溅射器。由于该溅射器采用静止的电磁场及匀速旋转圆简形靶材的新型结构，因此它具有靶材利用率高、使用周期长、换靶时间短等优点。可广泛适用于建筑物的幕墙玻璃等大型薄膜生产设备中。A new rotating cylindric magnetron sputtering is presented and successfully pro- duced by ourselves. The magnetron sputtering has the propersities of high using rate and long using cycle ,the reason of which are that the magnetic field is static and sputtered material is ro- tated round the middle axis. The kind of the magnetron sputtering can be extensively used on the large-scale continuous production lines ,such as achitectural glass et al. automatic production lines.

关 键 词：圆柱形 磁控溅射器 靶材 利用率 薄膜 

分 类 号：TN305.92[电子电信—物理电子学] O484.1[理学—固体物理]