投影光刻机的坐标系与套刻步进模型  

COORDINATE SYSTEMS AND STEPPING MODEL OF PROJECTION STEPPER

作　　者：胡淞[1] 姚汉民[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微细加工技术》1998年第3期1-6,共6页Microfabrication Technology

摘　　要：本文介绍 0 .35μm(亚半微米 )投影光刻机的机器、硅片、掩模、硅片对准、掩模对准等的坐标系 ,并根据各坐标系讨论套刻时硅片工件台的步进模型。This paper presents coordinate systems of machine, wafer, mask, wafer and mask alignment which are used for 0 35μm(sub half micron) projection stepper. According to these coordinate systems stepping model of wafer stage for overlay is also discussed.

关 键 词：投影光刻机 坐标系 步进模型 大规模集成电路 

分 类 号：TN470.57[电子电信—微电子学与固体电子学]