金刚石膜抛光表面缺陷对其红外透射率的影响  

Effect of the polished surface defects of diamond film on infrared transmission

作　　者：陈荣发[1] 陈曙光[2] 沈茂松[1] 沈兆侠[1] 戴良刚[1] 秦康生[1] 

机构地区：[1]扬州大学机械工程学院,江苏扬州225009 [2]江苏金方圆数控机床有限公司,江苏扬州225009

出　　处：《扬州大学学报（自然科学版）》2009年第3期30-33,共4页Journal of Yangzhou University：Natural Science Edition

基　　金：教育部博士点专项基金资助项目(20060287019);江苏省精密与微细制造技术重点实验室开放基金资助项目(JSPM200705);江苏省高等学校大学生实践创新训练计划资助项目;扬州大学科技创新培育基金资助项目(200809)

摘　　要：通过等离子体喷射CVD(chemical vapor deposition)方法生长了光学级金刚石厚膜,运用电火花和机械抛光技术对厚膜进行了双面抛光,并研究抛光表面缺陷对厚膜红外透射率的影响.结果表明:表面的台阶、孔洞、裂纹和沟槽等缺陷均会引起入射红外光波的散射和吸收,从而导致金刚石厚膜透射率的下降.表面的台阶、孔洞、裂纹和沟槽等缺陷厚膜的平均红外透射率分别为46.53%,62.56%,50.11%,58.26%.The optical class diamond film was prepared by DC plasma jet CVD （chemical vapor deposition） method, and a double-sided polishing was made by EDM and mechanical polishing technology. The investigations of the polished surface defects on the infrared transmission were tested in detail. The results showed that the surface of the steps, holes, cracks and defects such as groove could cause the incident infrared light scattering and absorption, which lead the infrared transmission rates of thick-film diamond to decline differently. The average infrared transmission rates of level surface, holes, cracks and grooves defects in thickfilm were 46. 53%, 62. 56%, 50. 11%, 58. 26% respectively.

关 键 词：CVD金刚石膜 表面缺陷 红外透射率 

分 类 号：TG174.442[金属学及工艺—金属表面处理]