射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征  

Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method

作　　者：陈冲 费振义[2,1] 亓永新[2,1] 曹宁[2,1] 张益博[2] 王风 吕震 李木森[2,1] 

机构地区：[1]山东省超硬材料工程技术研究中心,邹城273500 [2]山东大学材料液态结构及其遗传性教育部重点实验室,济南250061

出　　处：《金刚石与磨料磨具工程》2009年第5期7-12,共6页Diamond & Abrasives Engineering

基　　金：国家自然科学基金资助(50772060);山东省自然科学基金资助(Y2007F12);山东省博士后科研创新专项基金资助(200702024)

摘　　要：使用射频辉光放电等离子体辅助化学气相沉积技术(简称RFGDPECVD)在玻璃载玻片表面沉积类金刚石薄膜。用原子力显微镜(AFM)、摩擦试验仪、划痕试验机测定了其表面形貌、耐磨性及附着性。采用X射线光电子能谱(XPS)、分光光度计对两种气源(C4H10、C2H2)制备的DLC薄膜微观组成和透光率进行了检测和对比。结果表明:DLC薄膜的表面光滑、平整,表面粗糙度随沉积时间的增加单调递增;耐磨性及附着性优良;与C4H10相比使用C2H2作为碳源气体可以得到较高sp3含量和较低sp1含量的DLC膜;C2H2制备DLC薄膜的透光率低于C4H10;同一种碳源气体,反应流量比例越小,则DLC薄膜的透光性越好。The diamond-like carbon（DLC） films were successfully deposited on the glass substrates by radio frequency glow discharge plasma enhanced chemical vapor deposition （RFGDPECVD） technology method. The surface morphology, wear resistance and adhesion of the DLC films were tested by means of atomic force microscope （AFM）, friction tester and scratch tester. Also the microstructures and light transmittance rate of the DLC films by the two gas （C4 H10, C2 H2 ） were measured and compared by X-ray photoelectron spectroscopy （XPS） and spectrophotometer. The results show that the DLC films have smooth surface morphology and surface roughness increases with deposition time prolonged i their wear resistance and adhesion are excellent; higher sp3content and lower sp1 content in DLC films can be obtained in case of using C2H2 as a carbon source gas. However, the transmittance rate of DLC films by C2H2 is inferior to that by C4H10. For the same carbon source gas the lower the flow rate the better the light transmittance rate of DLC films.

关 键 词：射频辉光放电等离子体辅助化学气相沉积 类金刚石薄膜 放电特性 

分 类 号：TQ164[化学工程—高温制品工业] TB43[一般工业技术]