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作 者:张静[1,2] 徐会武[2] 李学颜[2] 苏明敏[1,2] 陈国鹰[1]
机构地区:[1]河北工业大学信息工程学院,天津300130 [2]中国电子科技集团公司第十三研究所,石家庄050051
出 处:《半导体技术》2009年第11期1066-1069,共4页Semiconductor Technology
基 金:国家自然科学基金(60676035);河北省自然科学基金(F2005000084)
摘 要:Au-Sn(质量分数为20%)共晶焊料有着优良的导热和导电特性,已被广泛应用在光电子和微电子的器件封装工业中。对微氰和无氰电镀Au-Sn合金的两种电镀方法进行了研究,概述了镀液组分和电镀工艺条件,用扫描电镜的方法测试不同电流密度下Au-Sn合金组分,用测厚仪测试镀层厚度,计算出镀速,最终确定电镀Au-Sn(质量分数为20%)合金的电镀条件,并对微氰和无氰电镀液优缺点进行了对比分析。Au-Sn (20%) eutectic solder has superior mechanical strength and thermal performance, so it is widely used in optoelectronics/electronics industry. Mcro-cyanide and non-cyanide eleetroplating solutions for Au-Sn alloy were developed, and the bath composition and plating conditions were overiviewed. The Sn content was tested in different current density by SEM (scanning electron microscope). Plating velocity was calculated by thickness of coating and time. The plating conditions of Au-Sn (20%) were determined. And the comparative analysis of advantages and disadvantages was made for micro-cyanide and non-cyanide electroplating solution
分 类 号:TN604[电子电信—电路与系统]
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