溅射工艺对GdTbFeCo薄膜磁光性能的影响  

Effect of sputtering technology on magneto-optical properties of GdTbFeCo thin films

作　　者：郭继花[1] 黄致新[1] 崔增丽[1] 杨磊[1] 邵剑波[1] 朱宏生[1] 章平[2] 

机构地区：[1]华中师范大学物理科学与技术学院,湖北武汉430079 [2]郧阳师范高等专科学校物理系,湖北丹江口442700

出　　处：《功能材料》2009年第11期1802-1804,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(60490291);湖北省教育资助项目(D20086002)

摘　　要：采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射工艺对GdTbFeCo薄膜磁光性能的影响。测量结果表明,基片与靶间距为72mm,溅射功率为75W,溅射气压为0.5Pa,薄膜厚度为120nm时,GdTbFeCo薄膜垂直方向矫顽力为477.6kA/m,克尔角为0.413°。GdTbFeCo magnetic thin films were prepared onto glass substrates by RF magnetron sputtering system. The effect of sputtering parameters on the magneto-optical properties of thin films were investigated. It is found that when the distance between the target and substrates, the sputtering power, sputtering pressure and thickness of the GdTbFeCo thin films are 72mm, 75W,0.5Pa and 120nm, respectively, the Kerr rotation angle and coercivity that in the perpendicular direction are as high as 0.41a~ and 6477.6kA/m.

关 键 词：射频磁控溅射 GdTbFeCo 磁光性能 溅射工艺 

分 类 号：TM271[一般工业技术—材料科学与工程]