真空磁控溅射镀膜设备及工艺技术研究  

Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess

作　　者：程建平[1] 杨晓东[1] 

机构地区：[1]中国电子科技集团公司第二研究所,山西太原030024

出　　处：《电子工业专用设备》2009年第11期27-31,共5页Equipment for Electronic Products Manufacturing

摘　　要：磁控溅射技术在薄膜制备领域广泛应用,适合的工艺和制造技术对磁控溅射镀膜有着重要的影响。介绍了用于薄膜电路的生产工艺流程以及由此而决定的设备组成及控制技术,并重点叙述了薄膜制备的方法、参数选择、设备设计方法。The technology of Vacuum Magnetron Sputtering Deposition is wide used on the field of thin film manufacture. Appropriate technics and manufacture technique have important influence to the quality of film. Flowchart of manufacturing film circuit and correlative equipment with its control technique are mainly mentioned in the article. And the article tries to solves some practical problem, such as the method, parameter and relevant equipment.

关 键 词：磁控溅射 镀膜工艺 设备 

分 类 号：TP2[自动化与计算机技术—检测技术与自动化装置]