溅射功率对GdTbFeCo薄膜磁光性能的影响  

Effect of sputtering power on magneto-optical properties of GdTbFeCo thin films

作　　者：郭继花[1] 黄致新[1] 崔增丽[1] 杨磊[1] 邵剑波[1] 

机构地区：[1]华中师范大学物理科学与技术学院,武汉430079

出　　处：《华中师范大学学报（自然科学版）》2009年第3期413-415,共3页Journal of Central China Normal University：Natural Sciences

基　　金：国家自然科学基金资助项目(60490291)

摘　　要：采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射功率对GdTbFeCo薄膜磁光性能的影响.测量结果表明:基片与靶间距为72 mm,溅射功率为75 W,溅射气压为0.5 Pa,薄膜厚度为120 nm时,GdTbFeCo薄膜垂直方向矫顽力达到5966 Oe,克尔角为0.413°.GdTbFeCo magnetic thin films were prepared onto glass substrates by RF magnetron sputtering system. The effect of sputtering power on the magneto-optical properties of the thin films was investigated. It is found that when the distance between the target and substrates, the sputtering power, sputtering pressure and thickness of the GdTbeFeCo thin films are 72 nm, 75 W, 0.5 Pa and 120 nm, respectively,the kerr rotation angle and coercivity that in the perpendicular direction are as high as 0. 413° and 5966 Oe.

关 键 词：射频磁控溅射 GdTbFeco 磁光性能 溅射功率 

分 类 号：TM271[一般工业技术—材料科学与工程]