硅衬底上高增透金刚石膜的制备研究  

Preparation of anti-reflective diamond film on Si substrate

作　　者：王鸿翔[1,2] 左敦稳[1] 卢文壮[1] 徐峰[1] 

机构地区：[1]南京航空航天大学机电学院,江苏南京210016 [2]淮安信息职业技术学院机电工程系,江苏淮安223003

出　　处：《功能材料》2009年第12期2008-2010,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50605032);江苏省自然科学基金资助项目(BK2007193)

摘　　要：采用甲烷和氢气作为工作气体,在热丝化学气相沉积(HFCVD)设备上采用五段式沉积法制备了金刚石薄膜,用扫描电子显微镜(SEM)、激光拉曼光谱仪、X射线衍射仪(XRD)、原子力显微镜(AFM)以及傅立叶红外光谱仪研究了金刚石膜的结构和性质。结果表明,采用五段式沉积法可以得到晶粒大小达到纳米级的、表面粗糙度较小、金刚石纯度较高的金刚石膜,其最大增透率超过70%,能满足作为光学窗口增透膜的应用要求。Diamond thin films were prepared using five-stage deposition method in the HFCVD system with methane and hydrogen as the gas source. Structure and character of diamond thin films were measured by SEM, Raman spectrum, XRD,AFM,FTIR. The results show that diamond thin film with nanosized grains,lower surface roughness and higher purity, and the highest IR transmission over 70% can be obtained adopting five-stage deposition method,and these properties ensure its application of optical window anti-reflective diamond films.

关 键 词：HFCVD 金刚石膜 增透 

分 类 号：TQ164[化学工程—高温制品工业] O484[理学—固体物理]