PCVD-Ti(CNO)薄膜的制备及性能的研究  

Study on PCVD-Ti(CNO) Films

作　　者：彭红瑞[1] 石玉龙[1] 谢雁[1] 李世直[1] 赵程[1] 

机构地区：[1]青岛化工学院等离子体表面技术研究所,266042

出　　处：《表面技术》1998年第5期11-13,共3页Surface Technology

摘　　要：研究了Ti(CN)薄膜内氧的作用.研究结果表明,Ti(CN)薄膜内加入氧后可以消除薄膜的柱状晶结构,薄膜的断口呈致密的纤维状组织.随着反应气体中空气或CO_2气体流量的增加,Ti(CNO)薄膜的硬度呈上升趋势,并在空气的流量为40ml/min或CO_2的流量为15ml/min时(分别约占总量的15%和6%)、薄膜的硬度达到最大值.This paper deals with the function of oxygen, in Ti(CNO) film prepared by PCVD. The results present that with the oxygen, the structure of Ti(CNO) films is fine grains instead of the columar grains of TiN. With the increasing of air or CO2 in reaction gases, the microhardness of Ti(CNO) films can be raised. And the highest micro-hardness of Ti(CNO) film appears when the flow rate of air is 40ml/min or CO2 15ml/min.

关 键 词：PCVD 薄膜 等离子体沉积 钛 金属 涂层 

分 类 号：TG174.442[金属学及工艺—金属表面处理]