离子轰击辅助电子束蒸发制备含有纳米石墨结构的非晶碳膜  

Preparation of a-C Films Consisted of Nano-graphite Structures by Ion Bombardment Assisted Electron Beam Evaporation Deposition

作　　者：唐多昌[1] 李晓红[1] 袁春华[1] 

机构地区：[1]西南科技大学理学院,四川绵阳621010

出　　处：《西南科技大学学报》2009年第4期9-12,28,共5页Journal of Southwest University of Science and Technology

基　　金：四川省教育厅青年基金(08zb006);西南科技大学博士研究基金(06zx7113)

摘　　要：采用离子轰击辅助电子束蒸发技术制备了含有纳米石墨结构的碳膜。利用XRD、Raman和AFM等方法分析了碳膜的厚度、结构、相成分和形貌。结果表明制备的碳膜是一种具有纳米石墨结构的非晶碳膜。随着离子轰击能量的增大,碳膜的厚度随之减小,纳米石墨结构sp2团簇的尺寸变大,碳膜表面粗糙度增大,并找到了最佳的离子轰击能量。通过对Raman光谱分析发现,在最佳离子轰击能量下形成的纳米石墨结构sp2团簇尺寸大小约为2 nm。The carbon films consisted of nano-graphite structures were prepared by ion bombardment assisted electron beam evaporation deposition. Different methods including XRD, Raman and AFM were employed for analyzing their thickness, structure and morphoIogy. The resuIts show that the films are a - C films with nano-graphite structure. With the increasing ion bombardment energy, the thickness of carbon films are reduced, the size of sp： clusters becomes larger, carbon film surface became more roughness and the best energy of ion bombardment is found. Raman spectra show that the sizes of sp2 clusters are about 2 nm under the best ion bombardment energy.

关 键 词：离子轰击 纳米石墨 非晶碳膜 

分 类 号：O484[理学—固体物理] Q613.71[理学—物理]