石英光纤表面镍-磷-硼化学镀层上电镀厚镍  

Thick nickel electroplating on the surface of electrolessly deposited nickel–phosphorus–boron alloy on quartz optical fiber

作　　者：蒋柏泉[1] 欧阳小平[1] 杨苏平[1] 张华[2] 彭健[2] 

机构地区：[1]南昌大学环境与化学工程学院,江西南昌330031 [2]南昌大学机电工程学院,江西南昌330031

出　　处：《电镀与涂饰》2009年第12期14-17,共4页Electroplating & Finishing

基　　金：国家"973"项目──光纤智能金属结构熔焊快速制造技术的基础研究(2005cca04300)

摘　　要：采用瓦特电镀液在石英光纤表面Ni–P–B化学镀层上制备了厚镍镀层。考察了硫酸镍、十二烷基硫酸钠、电流密度以及氧化镧对镍沉积速率和镀层质量的影响,确定了其最适宜值分别为180g/L、0.08g/L、0.8A/dm2和0.9g/L。用扫描电镜、体视显微镜对镀层的表面形貌进行了表征和分析。结果表明,稀土氧化镧细化了晶粒尺寸、提高了镀层的致密程度和显微硬度。制得的样品厚度约为840μm,显微硬度为334HV,电阻率为21μ?·cm,致密程度为96.4%,润湿时间为2s。Watt electroplating solution was used to prepare a thick nickel deposit on the surface of electroless Ni-P-B alloy coated quartz optical fiber. The effects of the nickel sulfate, sodium dodecyl sulfate, current density and lanthanum oxide on nickel deposition rate and coating quality were studied and their suitable values were determined to be 180 g/L, 0.08 g/L, 0.8 A/dm^2, and 0.9 g/L, respectively. Scanning electron microscopy and stereomicroscope were employed to characterize and analyze the surface morphology of the deposit. The results showed that lanthanum oxide helps reduce grain size and improve compactness and microhardness of the Ni coating. The prepared Ni deposit has a thickness of 840 μm, microhardness of 334 HV, resistivity of 21 μΩ·cm, densification degree of 96.4% and wetting time of 2 s.

关 键 词：石英光纤 镍-磷-硼合金 化学镀层 电镀镍 氧化 镧 沉积速率 可焊性 

分 类 号：TQ153.2[化学工程—电化学工业] TQ153.3