表面等离子体近场光刻制作二维纳米阵列  

Two Dimensional Nanoarray Fabricated by Near-Field Lithography Technology Based on Surface Plasmon

作　　者：李海军[1,2,3] 林文魁[1,2,3] 张晓东[1] 王逸群[1] 曾春红[1] 赵德胜[1] 王敏锐 张宝顺[1] 

机构地区：[1]中国科学院苏州纳米技术与纳米仿生研究所,江苏苏州215125 [2]中国科学院半导体研究所,北京100083 [3]中国科学院研究生院,北京100049

出　　处：《微纳电子技术》2010年第1期60-63,共4页Micronanoelectronic Technology

基　　金：苏州市科技发展计划(ZXG0712)

摘　　要：重点介绍了采用表面等离子体增强效应的近场光刻制作亚微米结构的二维点阵图形的技术。在研究亚波长纳米孔阵列超透射现象基本原理的基础上,应用有限差分时域(FDTD)算法数值模拟了周期性孔阵列的电场强度分布,讨论了纳米孔阵列所激发的表面等离子体激元提高近场光刻分辨率的微观机制。以金膜上的亚波长纳米孔阵列作为掩模版进行了接触式曝光实验,实际制作出了光刻胶的亚波长二维点阵图形,点阵图形的直径约为300nm,周期约为700nm。这种新型的微纳加工技术具有应用简单、成本低等特点,在大规模二维纳米点阵的制作方面有一定的应用潜力。The near-field lithography technology based on the surface plasmon to fabricate the sub-micron two dimensional lattice pattern was introduced. Based on the principle of extraordinary transmission, electrical field distribution of the periodic hole arrays was simulated and computed by finite-difference time-domain method, and the micromechanism of surface plasmon enhanced transmission of the near-field lithography was discussed. Sub-wavelength hole arrays were fabricated on the Au film as a mask for a contact exposure experiment, and the sub-wavelength two dimensional lattice pattern of the photoresist was made. The diameter of the lattice pattern is . about 300 nm, and the period is around 700 nm. The new micro-nano processing technology is simple and with low cost, and has a promising application in the large-scale production of two dimensional nanoarray.

关 键 词：表面等离子体 近场光刻 纳米孔阵列 二维纳米阵列 金膜 

分 类 号：O436[机械工程—光学工程]