反应磁控溅射碳化铪薄膜的微结构与力学性能  

Microstructure and Mechanical Properties of Hafnium Carbide Coatings Synthesized by Reactive Magnetron Sputtering

作　　者：许辉 祝新发 张晶晶 周颐辛 李冠群[2] 李戈扬[2] 

机构地区：[1]上海工具厂有限公司机械工业工具涂层技术重点实验室,上海200093 [2]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《表面技术》2010年第1期5-8,共4页Surface Technology

基　　金：国家科技支撑项目(2008BAF32B06)

摘　　要：为满足不同加工方式和加工条件下刀具对涂层的特殊要求,获得硬度高和耐摩擦性能优异的刀具涂层,采用反应磁控溅射方法制备了一系列不同碳含量的碳化铪薄膜。利用EDX,XRD,SEM,AFM和微力学探针表征了薄膜的微结构和力学性能,研究了C2H2分压(Ar和C2H2混合气体)对薄膜成分、相组成、微结构以及硬度和弹性模量的影响。结果表明,反应磁控溅射可以方便地制备碳化铪薄膜,但是,只有在C2H2分压为混合气体总压约3.0%附近很窄的范围内才可获得高硬度和高弹性模量的单相碳化铪薄膜,其最高硬度和弹性模量分别为27.9 GPa和255 GPa;低C2H2分压下所得薄膜由金属Hf和HfC两相组成,硬度较低;而过高的C2H2分压将导致薄膜形成非晶态,其硬度和弹性模量亦随之降低。Hafnium carbide coatings with different carbon contents were synthesized in Ar-Ce He mixture by reactive magnetron sputtering. Energy-dispersive X-ray, X-ray diffraction, scanning electron microscopy, atomic force microscopy and nanoindentation were employed to characterise their microstructure and mechanical properties. The effects of C2 He partial pressure on the composition, phase, microstructure and mechanical properties of the coatings were investigated. The results show that hafnium carbide coatings can be synthesized at a low partial pressure of C2 H2. The single phase HfC coating with columnar crystal and favorable mechanical properties could be obtained when the proportion of C2H2 partial pressure was only about 3.0% in the mixture, and the highest hardness and modulus were 27.9 GPa and 255 GPa respectively. The coating contains metal Hf and HfC phases and obtains low hardness under lower Ca Ha partial pressure. When the C2 H2 partial pressure is higher, the hardness and elastic modulus of acquired amorphous coatings decrease significantly.

关 键 词：碳化铪 硬质薄膜 微结构 力学性能 磁控溅射 

分 类 号：TG174.444[金属学及工艺—金属表面处理]