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机构地区:[1]哈尔滨工业大学超精密光电仪器工程研究所,黑龙江哈尔滨150001
出 处:《光学精密工程》2010年第2期317-325,共9页Optics and Precision Engineering
基 金:Supported by National Natural Science Foundation of China(Grant No.50675052)
摘 要:为了进一步校正激光直写中的邻近效应,对误差校正迭代方法进行了完善。用虚拟的高分辨力声光调制器对直写图案进行校正,然后将曝光量数据转换圆整为低分辨力声光调制器对应的曝光量数据,消除了低分辨力声光调制器校正直写图案时出现的退化现象;调制各误差区域重心最邻近光点的曝光量,以整体图案误差最小为判断标准进行串行寻优,解决了当被调制光点附近的图案正、负误差个数相等时无法进一步校正的问题。以无心方框图为例进行的仿真实验表明,使用低分辨力声光调制器时,改进的误差校正迭代方法能用于校正邻近效应,校正后图案误差相对原始误差减小了91.78%;使用高分辨力声光调制器时,图案误差相对原始误差减小了92.32%,继续应用本文方法校正后,图案误差相对原始误差可又减小1%。In order to further correct the optical proximity effect in laser direct writing, the Iterative Error-Correction Method (IECM) proposed by Rajesh Menon is improved from two aspects. Firstly, one virtual acoustooptic modulator with high resolution is used to correct the direct writing pattern, and then the exposure data obtained are converted and rounded to that corresponding to the low resolution acoustooptic modulator to avoid the degradation during correction. Secondly, the exposure dose of writing spot that is the nearest to each error area barycenter is modulated by taking the minimum whole pattern error as a yardstick to achieve serial global optimization, which avoids a failure to correct the optical proximity effect when the number of positive errors is equal to that of negative errors. By taking the centerless block diagram as the test pattern, numerical simulation results indicate that the optical proximity effect of pattern with a low resolution acoustooptic modulator can be preferably corrected and the corrected pattern error value is decreased by 91.78% as compared with the initial error value. Furthermore, the optical proximity effect of pattern with a high resolution acoustooptic modulator can be further improved after being corrected by IECM, and the corrected pattern error val ue is further decreased by 1% based on 92.32% as compared with the initial error value.
分 类 号:TN305.7[电子电信—物理电子学]
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