几种金属薄膜密度的测量  

DENSITY MEASUREMENTS OF Au,Ag,Cu,Pd AND Co FILMS DEPOSITED BY SPUTTERING METHODS

作　　者：王凤翔[1] 谭春雨[1] 刘继田 刘向东[1] 卢菲 孟鸣岐[1] 张兆林[1] 

机构地区：[1]山东大学物理系

出　　处：《山东大学学报（自然科学版）》1998年第4期388-392,共5页Journal of Shandong University(Natural Science Edition)

基　　金：山东省自然科学基金

摘　　要：用两种方法测量了几种金属薄膜的密度．介绍了应用卢瑟福背散射（ＲＢＳ）技术结合台阶仪测厚来测量薄膜密度的测量方法，并将所得结果进行了讨论。The densities of several metal films,such as Au,Ag,Cu,Pd and Co have been determined using two kinds of measurement methods.One is using a Dekdeck2A step instrument in conjunction with a microbalance,and the other is using the step instrument in conjunction with RBS(Rutherford Backscattering Spectrometry)analysis,to measure the density of the films.Comparing the results obtained by these methods,it is found that the first method is simple to understand and easy to operate,but it may produce some error caused by the nonuniformity of the film thickness;The second method can overcome this problem and get reliable results,but it is difficult to get the available RBS spectrum in case of the films are too thick or the elements in the substrate are heavier than those in the films.

关 键 词：薄膜密度 卢瑟福背散射 称重法 金属薄膜 测量 

分 类 号：O484.5[理学—固体物理]