温度对化学水浴法制备ZnS薄膜的影响  

Influence of Deposited Temperature on ZnS Thin Films by Chemical Bath

作　　者：徐鹏[1] 刘庭芝[2] 郭岚[1] 

机构地区：[1]南昌大学分析测试中心,南昌330047 [2]江西科技师范学院江西省表面材料工程重点实验室,南昌330029

出　　处：《材料导报》2010年第4期94-97,共4页Materials Reports

基　　金：江西省教育厅青年基金项目(GJJ09566);江西省自然科学基金(2008GQH0066)

摘　　要：采用化学水浴法在玻璃上制备了太阳能电池中的ZnS缓冲层。采用SEM、EDS、XRD和nkd-分光光度计等手段研究了水浴温度对ZnS薄膜的表面形貌、结构和光学性能的影响。结果表明,升高温度不能明显改变薄膜的结晶性、形貌和沉积生长方式,能否成膜与温度的关系也不大,但成膜速率对温度的依赖性较大。随温度的升高,薄膜的透过率先减小后增大,反射率则先增大后减小。对同一试样而言,透过率和反射率对应较好。当温度为70℃时,可制得禁带宽度为3.83eV、符合化学计量比、平整的非晶ZnS薄膜。ZnS thin films are prepared by chemical bath deposition on common glass substrates at different deposited temperature. In order to investigate the morphological, structural and optical properties of ZnS thin films have been investigated at different deposited temperature by SEM, EDS, XRD and nkd-spectrophotometer. Results show that with the increase of deposition temperature, the crystallinity, morphology and growth mode can not be improved evidently. Forming film or not is not dependence on the temperature. But the deposition rate of ZnS thin films has to depend on deposition temperature strongly. The transmission decreases firstly, increase finally, the reflectivity is in verse relationship with the temperature increasing. For the same sample, the transmission and refleetivity correspond well each other. When deposition temperature is 70℃, ZnS thin film is smooth and amorphous, near to stoichiometric proportion, 3.83eV of band gap.

关 键 词：化学水浴 ZNS薄膜 沉积温度 

分 类 号：O484.4[理学—固体物理]