射频磁控溅射制备ZnO光波导薄膜  

ZnO optical waveguide films prepared by rf magnetron sputtering

作　　者：李爽[1] 王凤翔[1] 付刚[1] 季艳菊[1] 赵俊卿[1] 

机构地区：[1]山东建筑大学理学院,山东济南250101

出　　处：《山东建筑大学学报》2010年第1期10-13,共4页Journal of Shandong Jianzhu University

基　　金：山东省中青年科学家科研奖励基金项目(2006BSB01447);山东省自然科学基金项目(ZR2009FM031)

摘　　要：采用射频磁控溅射技术在石英玻璃上制备出了具有高度c轴择优取向的ZnO薄膜。利用X射线衍射(XRD)、背散射分析(RBS)、棱镜耦合等技术对其结构、光波导性质进行研究,结果表明减小溅射压强有利于提高薄膜的结晶质量,增强薄膜的c轴择优取向。溅射压强越小,薄膜越厚,薄膜的有效折射率越接近晶体材料的折射率。ZnO thin films with a strong c-axis orientation are successfully deposited on quartz glass substrates at room temperature by radio frequency （rf） magnetron sputtering technology. X-ray diffraction, Rutherford backscattering, and prism coupling method were used to investigate the structure and optical properties of ZnO thin films. The results showed that lower sputtering pressure is propitious to increasing the crystallinity, and enhancing the c-axis orientation of the films. As the sputtering pressure decreasing, the thicker of films were increased, the closer effective refractive indices of ZnO films to crystal refractive indices.

关 键 词：ZNO薄膜 射频磁控溅射 光波导 X射线衍射 

分 类 号：O484.4[理学—固体物理]