Numerical studies on flow and thermal fields in MOCVD reactor  

作　　者：ZHONG ShuQuan REN XiaoMin HUANG YongQing WANG Qi HUANG Hui 

机构地区：[1]Key Laboratory of Optical Communication & Lightwave Technologies of Ministry of Education, Beijing University of Posts and Telecommunications, Beijing 100876, China

出　　处：《Chinese Science Bulletin》2010年第6期560-566,共7页

基　　金：supported by the National Basic Research Program of China (Grant No.2003CB314901);National Natural Science Foundation of China (Grant Nos.10875018,10773002 and 60576018);National High Technology Research and Development Program of China (Grant Nos.2006AA03Z416 and 2007AA03Z418);111 Project (Grant No.B07005);Program for Changjiang Scholars and Innovative Research Team in University (Grant No.IRT0609)

摘　　要：A systematic study has been performed to investigate the flow and thermal patterns of vertical rotating Thomas Swan MOCVD reactor at low pressure,using 2-D dynamic modeling.By varying and calculating the several important process parameters of the reactor,the optimized conditions of the uniform distributions of velocity and temperature profiles in steady state have been obtained.Then,time-dependent models with the step response perturbation of the total gas rate can help identify the visual transient behavior inside the reactor and analyze the mechanism of delay time,relaxation oscillation and pulsative oscillation.These results are beneficial to the process parameter optimization and geometrical configuration design of the MOCVD reactor.A systematic study has been performed to investigate the flow and thermal patterns of vertical rotating Thomas Swan MOCVD reactor at low pressure, using 2-D dynamic modeling. By varying and calculating the several important process parameters of the reactor, the optimized conditions of the uniform distributions of velocity and temperature profiles in steady state have been ob- tained. Then, time-dependent models with the step response perturbation of the total gas rate can help identify the visual transient behavior inside the reactor and analyze the mechanism of delay time, relaxation oscillation and pulsative oscillation. These results are beneficial to the process parameter optimization and geometrical configuration design of the MOCVD reactor.

关 键 词：金属有机化学气相沉积 反应器 数值研究 工艺参数优化 MOCVD生长 热场 旋转模式 动态建模 

分 类 号：TP311.13[自动化与计算机技术—计算机软件与理论] O472.3[自动化与计算机技术—计算机科学与技术]