磁控直流等离子体炬的磁流体动力学模型与仿真  

MHD model of DC plasma torch controlled by magnetic field and its simulation

作　　者：唐达培[1] 高庆[1] 李映辉[1] 吕反修[2] 

机构地区：[1]西南交通大学,成都610031 [2]北京科技大学,北京100083

出　　处：《应用力学学报》2010年第1期200-203,共4页Chinese Journal of Applied Mechanics

基　　金：四川省青年科技基金(08ZQ026-090);西南交通大学科学研究基金(2007B07)

摘　　要：以沉积金刚石膜的磁控直流等离子体炬为研究对象,在经典N-S流动方程和能量方程中引入多项源项(包括因外磁场和内部自感应磁场引起的洛伦兹力、辐射冷却、焦耳生热等),并结合组分质量守恒、广义欧姆定律及麦克斯韦方程组,建立了炬内等离子体的磁流体动力学(MHD)模型。利用二次开发后的FLUENT软件对所建MHD模型进行了仿真,得出了在有外磁场与无外磁场两种情形下,炬内及炬出口的温度和速度分布曲线。仿真结果证实,施加外磁场后,温度和速度的均匀性都得到了改善,有利于金刚石膜的沉积。A magneto-hydrodynamic (MHD) model of magnetic controlled DC plasma torch, which is used for diamond film deposition, is presented. The model includes the Navier-Stokes and the energy equations modified by the addition of some source terms, which reflect the Lorentz force due to the self-induced and the external magnetic fields, the radiative cooling and the Joule heating. In addition, the mass conservation and the species conservation equation, the generalized Ohm's law, and the Maxwell's equations are also modeled. The MHD model is solved with the second-developed software FLUENT. The distribution of the velocity and the temperature in the torch or at the torch outlet are obtained. Results show that the velocity and the temperature become more uniform by using external magnetic field, which is advantageous for diamond film deposition.

关 键 词：等离子体炬 磁流体动力学 外磁场 金刚石膜 FLUENT 

分 类 号：O361.3[理学—流体力学]