离子束溅射沉积Fe/Si多层膜法合成β-FeSi_2薄膜的研究  

Research on β-FeSi_2 thin films from Fe/Si multilayers deposited by ion beam sputtering

作　　者：张娟[1] 沈鸿烈[1] 鲁林峰[1] 唐正霞[1] 江丰[1] 李斌斌[1] 刘恋慈[1] 沈洲[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,江苏南京210016

出　　处：《功能材料》2010年第5期886-888,891,共4页Journal of Functional Materials

基　　金：国家高技术研究发展计划(863计划)资助项目(2006AA03Z219)

摘　　要：采用离子束溅射沉积Fe/Si多层膜的方法在石英衬底上制备了β-FeSi2薄膜,研究了不同厚度比的Fe/Si多层膜对β-FeSi2薄膜的结构性能、形貌及光学性能的影响。结果表明,厚度比为Fe(2nm)/Si(7.4nm)的多层膜在退火后完全生成了β-FeSi2相,表面致密均匀,其光学带隙为0.84eV,能量为1.0eV光子的吸收系数>105cm-1。β-FeSi2 films were prepared on quartz substrates by depositing Fe/Si multilayers with ion beam sputtering method.The effect of different thickness ratio of Fe/Si multilayers on microstructure,surface morphology and optical characteristics of the films were investigated.The results indicate that β-FeSi2 films of Fe（2nm）/Si（7.4nm） multilayers have a homogeneous and dense surface with single β-FeSi2 phase after annealing.A direct gap of 0.84eV was obtained by optical absorption measurement.The optical absorption coefficient is higher than 105cm-1 at 1.0 eV.

关 键 词：Β-FESI2 离子束溅射沉积 Fe/Si多层膜 石英衬底 

分 类 号：TB34[一般工业技术—材料科学与工程] TB303