工艺条件对金刚石膜红外透射率影响的研究  

Influence of process conditions on IR transmission of diamond film

作　　者：王鸿翔[1,2] 左敦稳[1] 卢文壮[1] 徐峰[1] 

机构地区：[1]南京航空航天大学机电学院,南京210016 [2]淮安信息职业技术学院机电工程系,江苏淮安223003

出　　处：《材料科学与工艺》2010年第3期322-325,共4页Materials Science and Technology

基　　金：国家自然科学基金资助项目(50605032);江苏省自然科学基金资助项目(BK2007193)

摘　　要：为了优化金刚石沉积工艺,制备高透射率的CVD金刚石薄膜,采用傅里叶红外光谱仪对不同工艺条件下制备的CVD金刚石膜的红外透射率进行了测量,分析了不同工艺条件对金刚石膜红外透射率的影响,获得了最佳沉积参数.结果表明,金刚石膜的红外透射率与工艺条件密切相关,当衬底温度为750℃,碳源体积分数为2%,压强为2.5kPa时沉积的金刚石膜红外透射率最佳.To optimize the deposition process of diamond and prepare the diamond with high transmittance,IR transmittance of CVD diamond film prepared under different process conditions was measured using Fourier transform infrared spectroscopy,and the influence of process conditions on IR transmittance of diamond film was analyzed.The best deposition parameters were obtained.The result shows that IR transmittance of the diamond film is closely related to process conditions.When the substrate temperature is 750 ℃,the volume fraction of carbon source is 2%,the pressure is 2.5 kPa,IR transmittance of the deposited diamond film is the best.

关 键 词：CVD 金刚石膜 红外透射率 工艺条件 

分 类 号：TQ164[化学工程—高温制品工业] O484[理学—固体物理]