氮流量比对直流反应磁控溅射制备氮化铬涂层组织和性能的影响  

Effect of N_2 Flow Rate on Structure and Property of CrN Coatings Deposited by DC Reactive Magnetron Sputtering

作　　者：谈淑咏[1] 张旭海[1] 吴湘君[1] 蒋建清[1] 

机构地区：[1]东南大学材料科学与工程学院,江苏省先进金属材料高技术研究重点实验室,南京211189

出　　处：《机械工程材料》2010年第7期34-37,共4页Materials For Mechanical Engineering

基　　金：国家科技支撑计划资助项目(2007BAE15B05)

摘　　要：采用直流磁控溅射法制备氮化铬涂层,研究了氮流量比对涂层相结构、表面形貌和硬度和涂层结合力的影响。结果表明:当氮流量比在30%～100%变化时,涂层主要由CrN相构成;随氮流量比增加,涂层晶粒形貌由三角锥转变为三角锥与球状共存,涂层变得致密,硬度得到提高;氮流量比对涂层结合力影响不大。Chromium nitride （CrN） coating was deposited by DC reactive magnetron sputtering. The effect of N2 flow rate on microstructure, surface morphology, hardness and bonding force of the CrN coating was studied. The results show that when N2 flow rate changed from 30% to 100%, the coating was mainly composed of CrN phase. With the increase of N2 flow rate the grain shape of CrN coatings changed from pyramidal to the coexistence pyramidal and spheroidal topography, and the coatings became denser, which led to the improvement of the hardness. The effect of N2 flow rate on bonding force of the coating was weak.

关 键 词：直流磁控溅射 氮流量比 氮化铬涂层 

分 类 号：TB3[一般工业技术—材料科学与工程] TG14[金属学及工艺—金属材料]