集成Si基低噪声放大器的注入损伤研究  被引量:14

Injection damage of the integrated silicon low-noise amplifier

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作  者:柴常春[1] 张冰[1] 任兴荣[1] 冷鹏[1] 

机构地区:[1]西安电子科技大学宽禁带半导体材料与器件教育部重点实验室,陕西西安710071

出  处:《西安电子科技大学学报》2010年第5期898-903,共6页Journal of Xidian University

基  金:国家自然科学基金资助项目(60776034)

摘  要:Si基和GaAs基低噪声放大器(LNA)内部有源器件的基极/发射极间是注入能量作用下容易损伤的敏感部位,同时Si基LNA内部的无源电阻也是外界能量作用下的易损薄弱环节之一.为了研究注入损伤机理和对LNA性能参数的影响,进行了能量色散谱(EDS)分析和表面形貌(SEM)分析.SEM分析表明,不同能量作用下的样品其内部无源电阻和晶体管基极分别出现了异常,而对比正常和异常区域的EDS谱表明电极异常区域的组分有明显变化.ADS2004A的仿真结果表明,能量作用后电阻损伤阻值增大引起LNA噪声系数和增益特性退化.实验结果表明,LNA噪声系数NF对能量的作用更敏感,能量注入对NF的影响远强于其对增益的影响,噪声系数NF的变化应作为Si基LNA能量作用损伤的判据之一.The area between the base and the emitter of a bipolar active device inside the silicon and GaAs low noise amplifiers(LNA) is most vulnerable to energy injection.Besides the active device,the interior passive resistance of Si-LNA is also one of the elements vulnerable to external energy injection.To study the damage mechanism of energy injection and its effect on the performance parameters of LNA,the energy-dispersive X-ray spectroscopy(EDS) analysis and the scanning electron microscope(SEM) analysis of the Si-LNA pre-and post-energy injection have been made.The SEM analysis indicates that the passive resistance and the base electrode of a bipolar junction transisitor have been abnormal respectively after the injection of various kinds of energy.A comparion between the energy-dispersive X-ray spectrums of normal and abnormal regions shows an obvious change in the constituents of the abnormal region of an electrode.Simulation results of ADS2004A indicate that the increase in resistance caused by passive resistance damage after energy injection leads to the degenerations of the LNA noise figure and gain characteristic.Meanwhile,experimental results show that the noise figure NF is more sensitive to energy injection than the gain characteristic,i.e.,the effect of energy injection on the noise figure is far stronger than that on the gain.Therefore,the change in the noise figure NF should be recognized as one of the significant criteria for the Si-LNA damage effect.

关 键 词:低噪声放大器 噪声系数 能量注入 损伤效应 无源电阻 

分 类 号:TN406[电子电信—微电子学与固体电子学]

 

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