非平衡线圈电流对掺钨含氢类金刚石碳膜力学和摩擦学性能的影响  

Effect of Unbalanced Coil Current on Mechanical and Tribological Properties of Tungsten-doped Hydrogenated Diamond-like Carbon Films

作　　者：杨拉毛草 周晖[1] 郑军[1] 桑瑞鹏[1] 万志华[1] 

机构地区：[1]兰州物理研究所表面工程技术国家重点实验室,甘肃兰州730000

出　　处：《润滑与密封》2010年第11期86-89,共4页Lubrication Engineering

摘　　要：利用非平衡磁控溅射技术在单晶硅片及9Cr18不锈钢基体表面制备不同非平衡线圈电流下的掺钨含氢类金刚石碳膜。采用Raman光谱以及红外光谱分析薄膜结构,采用纳米硬度测试仪和纳米划痕仪研究薄膜的纳米硬度和膜基附着力,在球-盘摩擦磨损试验机上测试薄膜的摩擦学性能。结果表明:制备的薄膜样品具有典型的类金刚石碳膜结构,薄膜中含氢量较高;非平衡线圈电流对等离子体的限制条件影响着薄膜的力学和摩擦学性能,薄膜硬度和弹性模量随着非平衡线圈电流增加而增大,薄膜的摩擦因数在非平衡线圈电流增加到最大值8 A时达到最小值0.118,在此参数下的耐磨寿命也最长。Tungsten-doped hydrogenated diamond-like carbon films were deposited on Si and 440C stainless steel substrates by unbalanced magnetron sputtering. The effect of unbalanced coil current on mechanical and tribological properties was investigsted. Microstructure of these films was analyzed by Raman spectroscopy and IR spectroscopy. Hardness and elastic modulus were tested. Tribological properties were studied on ball-on-disk tester. The results show that the films have typical diamond-like structure. Unbalanced coil current is a important factor influnencing the mechanical and tribological properties of tungsten-doped hydrogenated diamond-like carbon films, with the increase of unbalanced coil current, the film hardness and elastic modulus increase, the friction coefficient decreases.

关 键 词：非平衡磁控溅射 金刚石碳膜 力学性能 摩擦学性能 

分 类 号：TH117.1[机械工程—机械设计及理论]