蓝宝石衬底上透明Mg_xZn_(1-x)O薄膜的制备及表征  

PREPARATION AND CHARACTERIZATION OF TRANSPARENT Mg_xZn_(1-x)O FILM DEPOSITED ON SAPPHIRE SUBSTRATE

作　　者：张希艳[1] 刘全生[1] 王玉霞[1] 柏朝晖[1] 王晓春[1] 孙海鹰[1] 

机构地区：[1]长春理工大学光电功能材料教育部工程研究中心,长春130022

出　　处：《硅酸盐学报》2010年第11期2105-2109,共5页Journal of The Chinese Ceramic Society

基　　金：国家自然科学基金(50772016)资助项目

摘　　要：采用射频磁控溅射法在Al_2O_3(001)衬底上制备了高Mg含量的Mg_xZn_(1-x)O薄膜,研究了Mg_xZn_(1-x)O薄膜的结构和光学性能。结果表明:Al_2O_3(001)衬底上Mg_xZn_(1-x)O薄膜的组分为Mg_(0.47)Zn_(0.53)O,薄膜呈六方纤锌矿结构,薄膜沿c轴方向取向生长,且c轴方向晶格增大0.0029 nm。薄膜的吸收边峰值位于292nm,对应的禁带宽度为4.24ev。薄膜平均粒径约为10～20nm,在深紫外-可见光激发下的荧光发射峰分别位于320nm和400nm附近。MgxZn（1-x）O film with high Mg content was prepared on Al2O3（001） substrate by radio-frequency magnetron sputtering method.Micro-structure and optical properties of the MgxZn（1-x）O film were studied.The results show that the composition of the film deposited on Al2O3（001） substrate is Mg（0.47）Zn（0.53）O with hexagonal wurtzite structure.The growth orientation of the film is along c axis.The crystal lattic length in c direction increases 0.0029 nm compared with that of ZnO.The absorption edge peak of the film is at 292 nm and the corresponding band gap is 4.24 eV.The average diameter of the grains is about 10-20 nm.The fluorescent emission peaks are located at 320 and 400 nm under deep-ultraviolet light excitation respectively.

关 键 词：氧化锌镁 射频磁控溅射 蓝宝石衬底 透明薄膜 

分 类 号：TB43[一般工业技术]