高功率脉冲非平衡磁控溅射制备CrNx薄膜及其性能研究  

Study on deposition and properties of CrN_x films by high power pulsed unbalanced magnetron sputtering

作　　者：牟晓东[1] 牟宗信[1] 王春[1] 臧海荣[1] 刘冰冰[1] 董闯[1] 

机构地区：[1]三束材料改性教育部重点实验室,大连理工大学物理与光电工程学院,大连116024

出　　处：《核技术》2010年第12期951-954,共4页Nuclear Techniques

基　　金：国家自然科学基金(50407015);辽宁省教育厅科研项目资助

摘　　要：高功率脉冲磁控溅射技术(HPPMS)溅射粒子离化率高,可沉积致密、高性能薄膜,作为一种新技术在国外广泛研究。本文用高功率脉冲非平衡磁控溅射技术(HPPUMS)制备一系列CrN_x薄膜,采用原子力显微镜(AFM)和X射线衍射(XRD)对不同厚度的薄膜表面形貌、微观结构进行了分析,测定了薄膜的厚度和硬度,研究了薄膜的摩擦学性能,并与中频磁控溅射(MFMS)技术制备的CrN_x进行比较。结果表明,使用高功率脉冲非平衡磁控溅射技术(HPPUMS)能制备致密的CrN_x薄膜。薄膜有较好的综合性能,有较高硬度、较高结合强度和低摩擦系数。As a new deposition technology providing high ionization rate of sputtering materials and depositing dense films of high performance, the high-power pulsed magnetron sputtering （HPPMS） technology has been investigated in many countries. In this work, we prepared a series of CrNx films using high-power pulsed unbalanced magnetron sputtering （HPPUMS） technology. Morphology and microstructure of the films in different thickness were characterized with AFM and XRD. The film thickness and hardness were measured. Tribological performance of the films was tested and compared with films prepared by middle-frequency magnetron sputtering （MFMS）. The results show that HPPUMS technology is able to deposit CrNx films of higher hardness, higher bonding strength and lower coefficient of friction.

关 键 词：薄膜 气相沉积 脉冲功率 CrNx 硬度 

分 类 号：G31[文化科学] G321.6