脉冲偏压电弧离子镀制备C_(1-x-y)N_xZr_y超硬复合薄膜  

Superhard C_(1-x-y)N_xZr_y Composite Films Prepared by Pulsed Bias Arc Ion Plating

作　　者：李红凯[1] 林国强[1] 董闯[1] 

机构地区：[1]大连理工大学三束材料改性教育部重点实验室,大连116024

出　　处：《无机材料学报》2010年第5期517-521,共5页Journal of Inorganic Materials

基　　金：国家高技术研究发展计划资助项目(2006AA03Z521)

摘　　要：用脉冲偏压电弧离子镀方法在保持石墨靶弧流恒定的条件下,通过同步改变锆靶弧流与氮流量,在硬质合金基体上制备了一系列不同成分的C1-x-yNxZry复合薄膜.随着锆靶弧流与N流量增加,薄膜中Zr与N含量都呈线性增加,同时C含量快速减少.Raman光谱显示所制备的薄膜具有DLC特征,而XRD结果显示薄膜中还存在有明显的ZrN晶体相,说明本实验所制备的薄膜属于在DLC非晶基体上匹配有ZrN晶体相的碳基复合薄膜.随Zr与N含量增加,薄膜硬度先增大后降低,当x=0.19,y=0.28时薄膜具有最高硬度值,为43.6GPa,达到了超硬薄膜的硬度值.A series of C1-x-yNxZry composite films were deposited on a cemented carbide substrate using pulsed bias arc ion plating by adjusting the nitrogen flow rate and the Zr target arc current simultaneously with the graphite target arc current fixing.The Zr and N contents in the films increase linearly while the C content shows an inverse trend as the Zr target arc current and N flow rate increase.The Raman spectra indicate that the deposited films are the characteristic diamond-like carbon.XRD results show that the ZrN crystalline phase is formed in the films.The hardness first increases and then decreases with increasing Zr and N contents,reaching the highest superhard value of 43.6GPa at x=0.19,y=0.28.

关 键 词：类金刚石薄膜 超硬复合薄膜 脉冲偏压 电弧离子镀 

分 类 号：TB43[一般工业技术]