半导体制造刻蚀设备调度算法  

Etching equipment dispatching algorithm in semicondutor manufacturing

作　　者：郑彦东[1] 

机构地区：[1]郑彦东天津市信息中心,天津300040

出　　处：《计算机应用》2010年第12期280-281,共2页journal of Computer Applications

摘　　要：半导体生产线是目前世界上公认的最复杂的制造系统,刻蚀设备是半导体晶圆制造过程中最复杂的系统,刻蚀设备的调度算法是系统生产管理控制的核心功能。目前国内大多数的研究都是针对于fab级别的任务调度,而针对单独的刻蚀设备的优化算法的研究很少。提出一种基于规则的实时晶圆调度算法,力求实现生产周期缩短、提高设备产能的目标。The production line of semiconductor is the most complicated manufacturing system recognized world-wide,and etching equipment is the most complicated system in manufacture of semiconductor wafer.And dispatching algorithm of etching equipments is the core of system production control and management.At present,the most researches are directed to task dispatching in level fab domestically,few of which are directed to etching equipment alone.The author put forward a rule-based real-time wafer dispatching algorithm,to shorten the production cycle and improve equipment capacity.

关 键 词：调度算法 半导体 晶圆 刻蚀设备 

分 类 号：TP39[自动化与计算机技术—计算机应用技术]