离子源辅助中频磁控溅射法在活塞环表面沉积CrN涂层  

Chromium nitride coatings prepared by filament ion source-assisted medium-frequency magnetron sputtering

作　　者：闫少健[1] 王玲玲[1] 林宝珠[1] 刘传胜[1] 田灿鑫[1] 王泽松[1] 付德君[1] 

机构地区：[1]武汉大学加速器实验室,武汉430072

出　　处：《粉末冶金材料科学与工程》2010年第6期549-553,共5页Materials Science and Engineering of Powder Metallurgy

基　　金：国家科技重大专项(2009ZX04012-032)

摘　　要：用热丝弧光放电离子源辅助的中频磁控溅射装置在单晶硅和渗氮钢质活塞环上沉积CrN涂层,并用X射线衍射、原子力显微镜和电子显微镜测量涂层的微结构,用显微硬度计和球盘式摩擦磨损仪测量涂层的硬度和摩擦性能。与常规的中频磁控溅射法相比,采用离子源辅助磁控溅射法制备CrN涂层的沉积速率提高30%以上,达到4.0μm/h。在靶基距为90 mm,氮气分压比为0.14的优化条件下,沉积在活塞环上的CrN涂层结构为CrN(200)取向,涂层厚度达到25μm,硬度高达17.85 GPa,平均摩擦因数为0.48。CrN coatings were prepared on Si and cemented carbide substrates by a home-made medium-frequency magnetron sputtering system which is equipped with a thermal filament ion source.The structure and mechanical properties of the coatings were studied by X-ray diffraction,electron microscopy and micro-indenter and pin-on-disc wear tester.A high deposition rate of 4.0 mm/h has reached with the use of the ion source assistance in the medium-frequency magnetron sputter system.Under optimized conditions,CrN coatings have deposited on piston rings,with a thickness of 25 mm and hardness of 17.85 GPa.

关 键 词：中频磁控溅射 CRN 离子源 显微硬度 摩擦因数 

分 类 号：TG174.44[金属学及工艺—金属表面处理]