磁控反应溅射MoS_2/Ti/C复合薄膜的组织结构及摩擦磨损性能  

Microstructure and Tribological Properties of MoS_2/Ti/C Composite Film Deposited by Magnetron Reaction-Sputtering

作　　者：李倩倩[1,2] 尹桂林[2] 郑慈航[1] 余震[1] 何丹农[1,2] 

机构地区：[1]上海交通大学材料科学与工程学院,上海200240 [2]纳米技术及应用国家工程研究中心,上海200241

出　　处：《材料保护》2011年第3期14-16,88,共3页Materials Protection

基　　金：国家自然科学基金资助项目(50675131)

摘　　要：为了提高MoS2薄膜在室温潮湿大气条件下的摩擦磨损性能,通过磁控反应溅射制备了MoS2/Ti/C复合薄膜。采用能谱仪(EDS)、X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)对薄膜的成分、相组成和形貌进行表征,采用纳米压痕仪测试薄膜的结合力、纳米压痕硬度,采用多功能微摩擦磨损试验机测试薄膜的摩擦系数,并采用真彩色高分辨率共聚焦显微镜观察薄膜的磨损形貌。结果表明:与MoS2薄膜相比,含非晶态Ti和C的MoS2/Ti/C复合薄膜的(002)滑移面平行于基体表面生长,不含(100)面,结构致密,与基体的结合力提高了7.05倍,纳米压痕硬度提高了7.11倍;在室温潮湿大气条件下,MoS2/Ti/C复合薄膜比MoS2薄膜具有更低的摩擦系数和更优异的耐磨性能,平均摩擦系数为0.103,磨损率为9.67×10-7mm3/(N.m)。MoS2/Ti/C composite film was prepared by magnetron reaction-sputtering.The composition,phase structure and morphology of resultant composite film were analyzed by means of energy dispersive spectrometry,X-ray diffraction and field emission scanning electron microscopy.The adhesion to substrate and nano-indentation hardness of the composite film were measured using a nanoindenter.The friction coefficient of the composite film was evaluated using a multi-functional tribometer,and the worn surface morphology was observed using a high-resolution confocal microscopy.It was found that,as compared with MoS2 film,MoS2/Ti/C composite film had more compact microstructure,much higher adhesion to substrate and nano-indentation hardness,lower friction coefficient and better wear resistance.

关 键 词：磁控反应溅射 MoS2/Ti/C薄膜 MOS2薄膜 组织结构 摩擦磨损性能 

分 类 号：TB383.2[一般工业技术—材料科学与工程]