叶序结构抛光垫表面的抛光液流场分析  

Analysis of the Polishing Slurry Flow on the Polishing Pad Surface with Phyllotaxis Pattern

作　　者：吕玉山[1] 张田[1] 王军[1] 李楠[1] 段敏[1] 邢雪岭[1] 

机构地区：[1]沈阳理工大学机械工程学院,辽宁沈阳110159

出　　处：《润滑与密封》2011年第3期24-29,共6页Lubrication Engineering

基　　金：国家自然科学基金项目(50875179)

摘　　要：为了解决在化学机械抛光过程中抛光接触区域内抛光液的分布均匀性问题,基于生物学的叶序理论,设计葵花籽粒结构的仿生抛光垫,建立化学机械抛光抛光液流场的运动方程和边界条件,利用流体力学软件(Fluent)对抛光液的流动状态进行仿真,并获得叶序参数对抛光液流动状态的影响规律。结果表明:抛光液在基于葵花籽粒的仿生抛光垫的流动是均匀的,抛光液沿着逆时针和顺时针叶列斜线沟槽流动,有利于流体向四周发散。In order to make the polishing slurry distribution more uniform over the polishing region during the chemical mechanical polishing（CMP） ,a new kind of polishing pad that has sunflower seed pattern was designed by the phyllotaxis theory of biology, the fluid field equations and boundary conditions of polishing slurry flow in CMP were established. By using computational fluid dynamics software（Fluent） , the flow state of the polishing slurry were simulated and the effects of the phyllotaxis parameters of polishing pad on the flow field of polishing slurry were analyzed. The results show that the slurry flows along the counterclockwise and clockwise spiral grooves of phyllotaxis pattern which makes fluid flow divergence around,when the polishing slurry is imported from the center of phyllotaxis polishing pad.

关 键 词：化学机械抛光 抛光垫 抛光液 流场 叶序分布 

分 类 号：TH117.1[机械工程—机械设计及理论]