溅射气压对碳化钒薄膜微结构与力学性能的影响  

Influence of Ar Pressure on Microstructures and Properties of Vanadium Carbide Coating

作　　者：沈洁[1] 李冠群[1] 李玉阁[1] 李戈扬[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200240

出　　处：《真空科学与技术学报》2011年第2期216-220,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(U0774001);国家科技支撑项目(No.2008BAF32B06)

摘　　要：采用碳化钒靶的磁控溅射方法在不同的Ar气压下制备了一系列碳化钒薄膜,利用能量分析光谱仪,X射线衍射,扫描电子显微镜,原子力显微镜和微力学探针研究了气压对薄膜成分、相组成、微结构以及力学性能的影响。结果表明磁控溅射VC陶瓷靶可以方便地制备晶体态的单相碳化钒薄膜,并且溅射气压对薄膜的化学成分、相组成、微结构以及相应的力学性有较大的影响。在溅射气压为2.4~3.2 Pa的范围内,可获得结晶程度好和硬度与弹性模量较高的碳化钒薄膜,其最高硬度和弹性模量分别为28,269 GPa。低的溅射气压（0.32~0.9 Pa）下,所得薄膜结晶较差且硬度较低;过高的溅射气压（〉4.0 Pa）,薄膜的溅射速率降低,结晶变差,其硬度和弹性模量亦随之降低。低气压下薄膜碳含量较高和高气压下溅射原子能量降低可能是薄膜结晶程度降低的主要原因。The vanadium carbide（VC） coatings were deposited by magnetron sputtering of VC ceramic target in different argon pressures on substrates of stainless steel.The impacts of the Ar pressure on VC film growth were studied.The microstructures and mechanical properties of VC coatings were characterized with X-ray diffraction,X-ray energy dispersive spectroscopy,scanning electron microscopy,atomic force microscopy and nanoin dentation.The results show that the Ar pressure strongly affects the microstructures and mechanical properties of VC coating：at low pressure（0.32～0.9 Pa）,poor crystallization and low hardness were observed;at a pressure ranging from 2.4 Pa to 3.2 Pa,the well crystallized coatings were obtained with the highest hardness up to 28 GPa;at a pressure higher than 4.0 Pa,the crystallization and hardness deteriorated.Possible mechanisms were also tentatively discussed.

关 键 词：碳化钒 硬质薄膜 微结构 力学性能 磁控溅射 

分 类 号：O484.4[理学—固体物理]