一维原子光刻经典模型的优化  

Optimization of Particle Optics Model for One-Dimentional Atom Lithography

作　　者：张萍萍[1] 马艳[1] 李同保[1] 

机构地区：[1]同济大学物理系,上海200092

出　　处：《光学学报》2011年第5期150-154,共5页Acta Optica Sinica

基　　金：国家自然科学基金(10804084)资助课题

摘　　要：利用蒙特卡罗随机思想选取轨迹初始条件,将铬原子束同位素、纵向速度分布和横向高斯发散角等因素综合考虑,对原子光刻经典粒子模型进行了优化。将优化后的模型与原模型进行了对比,同时定性分析了表面生长效应。利用新模型在不同激光功率下对沉积过程进行数值模拟,结果表明模拟结果与实验符合得很好。进一步分析了失谐对沉积的影响,当失谐选取250×2πMHz时,可得到较好的沉积结果。该模型较好地整合了沉积过程中的各个影响因素,这为正在进行的实验提供了更好的理论基础。Particle optics model for one-dimentional atom lithography is optimized with Monte-Carlo method.The initial condition of each trajectory is stochastically selected.The effects of isotope,longitudinal velocity distribution and transverse Gaussian divergence are systematically evaluated.Optimized model is compared with original model and the surface growth effect is described qualitatively.Excellent agreement is seen between numerical simulation and experiment under different laser powers.Furthermore,the effect of detuning is also discussed.It is found that good result can be obtained when the detuning is 250×2π MHz.The model presented takes all the factors into consideration and it provides better theoretical guide for current experiment.

关 键 词：激光光学 原子光刻 纳米计量 粒子光学 蒙特卡罗方法 

分 类 号：O436[机械工程—光学工程]